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Material : High Purity Fused Silica (SiO2 > 99.99%)
Base Dimensions : 2mm x 2mm
Cavity Type : Center Conical Tapered Pit
Max Operating Temperature : 1100°C
Chemical Resistance : HF, Strong Acid & Alkali, Organic Solvents
Thermal Expansion : CTE 5.5 x 10^-7 /°C (Low)
Surface Finish : Precision Machined, Smooth & Chip-Free
Purity : No Metal Ion Precipitation
Application : Optical Micro Sample Holder, Semiconductor Positioning Base, Micro Reagent Cell
The Quartz Substrate with Conical Cavity (base 2mm x 2mm with center tapered pit) is a high-precision optical-grade quartz component designed for micro-sample positioning, optical testing, and semiconductor experimentation. Precision machined from high-purity fused silica (SiO2 > 99.99%) with a smooth, chip-free cone recess, it delivers exceptional thermal stability up to 1100°C, outstanding chemical resistance to HF and aggressive reagents, and zero ion leaching — making it the ideal platform for the most demanding micro-scale optical and semiconductor applications.
| Industry | Application |
|---|---|
| Optical Sample Testing | Fixed-point holder for micro particles and powder samples with transparent base enabling light transmission detection and spectroscopic analysis |
| Semiconductor Experimentation | Positioning and alignment base for micro components with precision cavity restricting movement during testing |
| Micro Chemical Testing | Nano-liter reagent cell with conical recess for micro-volume chemical reactions and analysis under microscope |
vs. Plastic/Polymer Substrate: Plastics swell and degrade in organic solvents and cannot withstand high temperatures; this quartz substrate resists all solvents and acids, withstands 1100°C, and can be repeatedly cleaned and reused without degradation
vs. Borosilicate Glass Substrate: Borosilicate glass softens above 500°C and is attacked by HF; quartz substrate maintains integrity at 1100°C and is fully resistant to hydrofluoric acid and all corrosive media
| Parameter | Value |
|---|---|
| Material | High Purity Fused Silica (SiO2 > 99.99%) |
| Base Dimensions | 2mm x 2mm |
| Cavity Type | Center Conical Tapered Pit |
| Max Operating Temperature | 1100°C |
| Chemical Resistance | HF, Strong Acid & Alkali, Organic Solvents |
| Thermal Expansion | CTE 5.5 x 10^-7 /°C (Low) |
| Surface Finish | Precision Machined, Smooth & Chip-Free |
| Purity | No Metal Ion Precipitation |
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Smooth Fused Quartz Substrate Conical Cavity For Optical Sample Analysis Images |